Domestic Production of Deuterium Ammonia for Semiconductors Becomes Possible... Korea Institute of Energy Research Achieves First Commercial-Scale Success [Reading Science]

Over 99% High Purity Achieved, 1,000-Hour Continuous Operation Verified
Stabilization Expected for Specialty Gas Supply Chain Previously Dependent on Japan and China

The possibility of domestic production of deuterium ammonia, a key specialty gas used in semiconductor processes, has opened up. As a Korean research team has succeeded for the first time in producing high-purity deuterium ammonia at a commercial scale, which had previously been dependent on imports from Japan and China, expectations are rising for the stabilization of the semiconductor material supply chain.

The Korea Institute of Energy Research (KIER) announced on June 11 that Dr. Hyoungchul Yoon’s research team has developed a technology to produce high-purity deuterium ammonia (ND₃) with a purity of over 99% for the first time in Korea and has also completed verification of the production process at a commercialization level.

Daily 7 kg deuterium ammonia production process equipment. Provided by the Korea Institute of Energy Research

Deuterium ammonia is an isotopic compound in which the hydrogen (H) in ordinary ammonia (NH₃) is replaced with deuterium (D). When used in semiconductor manufacturing processes, it can reduce internal defects in devices and improve performance and reliability, leading to increasing demand in the advanced semiconductor industry.

However, with no related production technology or facilities in Korea, the country has relied almost entirely on overseas suppliers, mainly from Japan and China. As a result, the need for domestic production to secure supply chain stability and price competitiveness has been consistently raised.

The research team succeeded in producing deuterium ammonia at a scale of 7.7 kg per day using a ruthenium (Ru)-based catalyst they independently developed. In particular, by lowering the reaction pressure to one-fifth of that in conventional processes and improving temperature conditions, they were able to stably synthesize deuterium ammonia with a purity of over 99%.

The key lies in the improvement of catalyst performance. The researchers added barium oxide (BaO) to the conventional ruthenium catalyst, significantly lowering the energy barrier in the nitrogen dissociation reaction, which is considered the most difficult step in ammonia synthesis. Barium oxide increases the electron density on the ruthenium surface, weakening the bond of the nitrogen molecule and enabling ammonia synthesis at much lower temperatures and pressures than before.

The research team verified the stability of the developed process by operating it continuously for more than 1,000 hours. They also obtained certification from the Korea Testing Laboratory (KTL), confirming the reliability and durability of the process.

Research team photo. From left to right: Seonhyung Kim, Senior Researcher, Heetae Beom, Senior Engineer, Hyeongcheol Yoon, Senior Researcher, Jaehyung Kim, Senior Researcher. Provided by Energy Yeon.

Notably, it was found that no impurities were generated during the production process that could affect semiconductor performance, enabling the stable production of ultra-high-purity deuterium ammonia.

The Korea Institute of Energy Research evaluated this achievement as a case that demonstrates not only laboratory success but also the potential for actual industrial application. The institute plans to expand production scale and optimize the process in the future to enter the isotope material market for semiconductors, displays, and precision chemical industries.

Dr. Hyoungchul Yoon stated, "We have proven the possibility of producing high-value-added isotope materials required for semiconductor processes by utilizing Korea's proprietary ammonia synthesis technology," and added, "Based on our low-pressure, low-temperature process technology and long-term operation experience, we aim to expand this platform for producing advanced chemical materials needed in the semiconductor, display, and precision analysis industries."

This content was produced with the assistance of AI translation services.