KIER Develops High-Performance Catalyst for Fluorinated Gas Decomposition... Applicable to Semiconductor and Other Industries
A high-performance catalyst for the decomposition of fluorinated gases has been developed.
The Korea Institute of Energy Research (KIER) announced on August 21 that Dr. Singeun Lee and his CCS research team have developed a new catalyst capable of stably decomposing greenhouse gases generated during semiconductor and display manufacturing processes at low temperatures.
(From left) Student researcher Eunhan Lee, student researcher Wonseop Jo, Dr. Singeun Lee, and principal researcher Duwon Seo are posing for a commemorative photo. Provided by Korea Institute of Energy Research.
View original imageFluorinated gases such as carbon tetrafluoride (CF4) and hexafluoroethane (C2F6) are primarily produced in semiconductor and display manufacturing processes. The greenhouse effect of these fluorinated gases is known to be more than 5,000 times greater than that of carbon dioxide. Considering the continued growth of the semiconductor and display industries alongside the rapid advancement of artificial intelligence (AI), the decomposition and treatment of fluorinated gases has become increasingly important.
To address this, the industry utilizes greenhouse gas removal technologies such as combustion and plasma methods. However, the combustion method has the drawback of generating carbon dioxide, while the plasma method requires a large amount of electricity, making it unsuitable for large-scale processing.
For this reason, the United States and Japan have been actively researching catalytic decomposition methods since the 1990s, which can handle large-scale decomposition without emitting carbon dioxide.
However, the decomposition catalysts developed so far require high operating temperatures above 750 degrees Celsius, demanding significant energy. In addition, their lifespan is less than 1,000 hours, highlighting the need for technology to overcome economic and durability limitations.
The catalyst developed by KIER overcomes the limitations of existing catalytic reactions, maintaining its performance even after 4,000 hours of continuous operation at relatively low temperatures.
Fluorinated gases such as carbon tetrafluoride are decomposed through a hydrolysis reaction with water. For fluorinated gases to react quickly and extensively with water even at low temperatures, the catalyst must have ample space to accommodate the gases. This concept is referred to as "Lewis acid sites." Increasing the number of Lewis acid sites requires optimizing the zinc content within the catalyst.
Based on this concept, KIER successfully maximized the number of Lewis acid sites by optimally adjusting the content of zinc, alumina, and phosphorus within the catalyst. As a result, the newly developed catalyst demonstrated the ability to stably decompose high concentrations of carbon tetrafluoride (over 5,000 ppm) at 700 degrees Celsius, which is 50 degrees lower than the operating temperature of conventional catalysts, achieving a decomposition rate of over 98%. The lower operating temperature also improved energy efficiency by more than 10% compared to existing technologies.
Notably, during testing, the catalyst maintained its performance even after 4,000 hours of continuous operation at a concentration of 5,000 ppm, demonstrating long-term durability. This is more than twice the commercial standard, which is 1,000 hours of continuous operation at 2,000 ppm.
KIER also confirmed that the developed catalyst can simultaneously decompose not only perfluorocarbons but also sulfur hexafluoride (SF6) and nitrogen trifluoride (NF3), which are generated in semiconductor processes. It was also found to be effective in decomposing refrigerant gases such as pentafluoroethane, thereby expanding its range of applications.
A method for mass-producing the developed catalyst has also been established. By applying an extrusion process to catalyst production, the shape and size of the catalyst can be flexibly adjusted according to its intended use.
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Dr. Singeun Lee stated, "The developed catalyst is a versatile solution capable of treating various fluorine-based compounds and waste refrigerants emitted from semiconductor and display processes. KIER expects that this catalyst can contribute to achieving the national greenhouse gas reduction targets by being applied not only in the semiconductor and display industries but also in scrapyards and waste electronics facilities."
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